Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation; Key Engineering Materials; Vol. 683 : Multifunctional Materials: Development and Application
| Parent link: | Key Engineering Materials: Scientific Journal Vol. 683 : Multifunctional Materials: Development and Application.— 2016.— [P. 383-388] |
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| 要約: | Title screen This paper presents the results of the studies of the structure and chemical composition of nitrogen-doped titanium dioxide thin films obtained by reactive magnetron sputtering deposition. The XRD data show the changes of the structure and phase composition of titanium dioxide thin films due to the nitrogen doping. The change of the films structure increases with the growth of the nitrogen content. The reduction of crystallites size takes place at the increase of the nitrogen concentration. Chemical bonds present in the films were examined by FTIR spectroscopy. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
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2016
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| シリーズ: | Physicochemical Properties of Materials and Current Processing Technologies |
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| オンライン･アクセス: | http://dx.doi.org/10.4028/www.scientific.net/KEM.683.383 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646637 |