The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode
| Parent link: | Key Engineering Materials: Scientific Journal Vol. 685 : High Technology: Research and Applications 2015 (HTRA 2015).— 2016.— [P. 643-647] |
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| अन्य लेखक: | , , , , |
| सारांश: | Title screen Silicon-carbon coatings on silicon substrates were deposited in plasma based nonself-sustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa. Режим доступа: по договору с организацией-держателем ресурса |
| भाषा: | अंग्रेज़ी |
| प्रकाशित: |
2016
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| श्रृंखला: | Discharge and Plasma-Beam Technology |
| विषय: | |
| ऑनलाइन पहुंच: | http://dx.doi.org/10.4028/www.scientific.net/KEM.685.643 |
| स्वरूप: | इलेक्ट्रोनिक पुस्तक अध्याय |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646506 |