The Forming of Model Colloid System; Advanced Materials Research; Vol. 971-973 : New Technologies for Engineering Research and Design in Industry

Бібліографічні деталі
Parent link:Advanced Materials Research: Scientific Journal
Vol. 971-973 : New Technologies for Engineering Research and Design in Industry.— 2014.— [P. 266-269]
Автор: Voyno D. A. Denis Aleksandrovich
Співавтор: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра общей химии и химической технологии (ОХХТ)
Інші автори: Machekhina K. I. Ksenia Igorevna, Shiyan L. N. Lyudmila Nikolaevna
Резюме:Title screen
The paper reports on the creation of a model colloid test system which is similar to groundwater and it can be used as a test system in the water treatment. It is found that at the molar ratio iron/silicon/organic substance is equal to1/7/2 and two orders such as organic substances-Si-Fe and Si-organic substances-Fe, stable colloid system is formed. The mechanism of formation of iron colloid system is described by three steps. The first is the formation of the organosilicon complexes. The second is oxidation of the iron and forming of Fe (OH)3. The last is forming a sol at zeta potential is - 35 mV with electrostatic interaction.
Режим доступа: по договору с организацией-держателем ресурса
Мова:Англійська
Опубліковано: 2014
Серія:Materials Science and Chemical Engineering
Предмети:
Онлайн доступ:http://dx.doi.org/10.4028/www.scientific.net/AMR.971-973.266
Формат: Електронний ресурс Частина з книги
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646210

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