The Forming of Model Colloid System; Advanced Materials Research; Vol. 971-973 : New Technologies for Engineering Research and Design in Industry

Bibliographische Detailangaben
Parent link:Advanced Materials Research: Scientific Journal
Vol. 971-973 : New Technologies for Engineering Research and Design in Industry.— 2014.— [P. 266-269]
1. Verfasser: Voyno D. A. Denis Aleksandrovich
Körperschaft: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра общей химии и химической технологии (ОХХТ)
Weitere Verfasser: Machekhina K. I. Ksenia Igorevna, Shiyan L. N. Lyudmila Nikolaevna
Zusammenfassung:Title screen
The paper reports on the creation of a model colloid test system which is similar to groundwater and it can be used as a test system in the water treatment. It is found that at the molar ratio iron/silicon/organic substance is equal to1/7/2 and two orders such as organic substances-Si-Fe and Si-organic substances-Fe, stable colloid system is formed. The mechanism of formation of iron colloid system is described by three steps. The first is the formation of the organosilicon complexes. The second is oxidation of the iron and forming of Fe (OH)3. The last is forming a sol at zeta potential is - 35 mV with electrostatic interaction.
Режим доступа: по договору с организацией-держателем ресурса
Sprache:Englisch
Veröffentlicht: 2014
Schriftenreihe:Materials Science and Chemical Engineering
Schlagworte:
Online-Zugang:http://dx.doi.org/10.4028/www.scientific.net/AMR.971-973.266
Format: MixedMaterials Elektronisch Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646210

MARC

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330 |a The paper reports on the creation of a model colloid test system which is similar to groundwater and it can be used as a test system in the water treatment. It is found that at the molar ratio iron/silicon/organic substance is equal to1/7/2 and two orders such as organic substances-Si-Fe and Si-organic substances-Fe, stable colloid system is formed. The mechanism of formation of iron colloid system is described by three steps. The first is the formation of the organosilicon complexes. The second is oxidation of the iron and forming of Fe (OH)3. The last is forming a sol at zeta potential is - 35 mV with electrostatic interaction. 
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