Национальный исследовательский Томский политехнический университет (ТПУ) Институт кибернетики (ИК) Кафедра прикладной математики (ПМ), Koval T. V. Tamara Vasilievna, Devyatkov V. N. Vladimir Nikolaevich, Nguyen Bao Khyng, & Uglov V. V. Vladimir Vasilievich. (2015). Plasma-cathode electron source based on a low-pressure arc discharge in the mode of the emission current enhancement; High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes; Vol. 19, iss. 1. 2015. https://doi.org/10.1615/HighTempMatProc.2015015733
Chicago Style (17th ed.) CitationНациональный исследовательский Томский политехнический университет (ТПУ) Институт кибернетики (ИК) Кафедра прикладной математики (ПМ), Koval T. V. Tamara Vasilievna, Devyatkov V. N. Vladimir Nikolaevich, Nguyen Bao Khyng, and Uglov V. V. Vladimir Vasilievich. Plasma-cathode Electron Source Based on a Low-pressure Arc Discharge in the Mode of the Emission Current Enhancement; High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes; Vol. 19, Iss. 1. 2015, 2015. https://doi.org/10.1615/HighTempMatProc.2015015733.
MLA (9th ed.) CitationНациональный исследовательский Томский политехнический университет (ТПУ) Институт кибернетики (ИК) Кафедра прикладной математики (ПМ), et al. Plasma-cathode Electron Source Based on a Low-pressure Arc Discharge in the Mode of the Emission Current Enhancement; High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes; Vol. 19, Iss. 1. 2015, 2015. https://doi.org/10.1615/HighTempMatProc.2015015733.