Magnetron deposition of coatings with evaporation of the target
| Parent link: | Technical Physics.— , 1931- Vol. 60, №12.— 2015.— [P. 1790-1795] |
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| 第一著者: | |
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| その他の著者: | , |
| 要約: | Title screen We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering. Режим доступа: по договору с организацией-держателем ресурса |
| 出版事項: |
2015
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| シリーズ: | Plasma |
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| オンライン･アクセス: | http://dx.doi.org/10.1134/S1063784215120026 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645798 |