Magnetron deposition of coatings with evaporation of the target

Magnetron deposition of coatings with evaporation of the target

التفاصيل البيبلوغرافية
Parent link:Technical Physics.— , 1931-
Vol. 60, №12.— 2015.— [P. 1790-1795]
المؤلف الرئيسي: Bleykher (Bleicher) G. A. Galina Alekseevna
مؤلف مشترك: Национальный исследовательский Томский политехнический университет
مؤلفون آخرون: Krivobokov V. P. Valery Pavlovich, Yuryeva A. V. Alena Victorovna
الملخص:Title screen
We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering.
Режим доступа: по договору с организацией-держателем ресурса
اللغة:الإنجليزية
منشور في: 2015
سلاسل:Plasma
الموضوعات:
электронный ресурс
труды учёных ТПУ
магнетронное осаждение
испарения
الوصول للمادة أونلاين:http://dx.doi.org/10.1134/S1063784215120026
التنسيق: الكتروني فصل الكتاب
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645798

مواد مشابهة

مواد مشابهة