Magnetron deposition of coatings with evaporation of the target; Technical Physics; Vol. 60, №12

Magnetron deposition of coatings with evaporation of the target; Technical Physics; Vol. 60, №12

Opis bibliograficzny
Parent link:	Technical Physics.— , 1931- Vol. 60, №12.— 2015.— [P. 1790-1795]
1. autor:	Bleykher (Bleicher) G. A. Galina Alekseevna
Korporacja:	Национальный исследовательский Томский политехнический университет
Kolejni autorzy:	Krivobokov V. P. Valery Pavlovich, Yuryeva A. V. Alena Victorovna
Streszczenie:	Title screen We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering. Режим доступа: по договору с организацией-держателем ресурса
Język:	angielski
Wydane:	2015
Seria:	Plasma
Hasła przedmiotowe:	электронный ресурс труды учёных ТПУ магнетронное осаждение испарения
Dostęp online:	http://dx.doi.org/10.1134/S1063784215120026
Format:	Elektroniczne Rozdział
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645798

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