Magnetron deposition of coatings with evaporation of the target; Technical Physics; Vol. 60, №12
| Parent link: | Technical Physics.— , 1931- Vol. 60, №12.— 2015.— [P. 1790-1795] |
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| প্রধান লেখক: | |
| সংস্থা লেখক: | |
| অন্যান্য লেখক: | , |
| সংক্ষিপ্ত: | Title screen We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering. Режим доступа: по договору с организацией-держателем ресурса |
| ভাষা: | ইংরেজি |
| প্রকাশিত: |
2015
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| মালা: | Plasma |
| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://dx.doi.org/10.1134/S1063784215120026 |
| বিন্যাস: | বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645798 |
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| 200 | 1 | |a Magnetron deposition of coatings with evaporation of the target |f G. A. Bleykher (Bleicher), V. P. Krivobokov, A. V. Yuryeva | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a Plasma | |
| 300 | |a Title screen | ||
| 320 | |a [References: 12 tit.] | ||
| 330 | |a We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Technical Physics |d 1931- | ||
| 463 | |t Vol. 60, №12 |v [P. 1790-1795] |d 2015 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a магнетронное осаждение | |
| 610 | 1 | |a испарения | |
| 700 | 1 | |a Bleykher (Bleicher) |b G. A. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1961- |g Galina Alekseevna |3 (RuTPU)RU\TPU\pers\31496 |9 15657 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
| 701 | 1 | |a Yuryeva |b A. V. |c specialist in the field of hydrogen energy and plasma technologies |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1983- |g Alena Victorovna |3 (RuTPU)RU\TPU\pers\33389 |9 17084 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |c (2009- ) |9 26305 |
| 801 | 2 | |a RU |b 63413507 |c 20170414 |g RCR | |
| 850 | |a 63413507 | ||
| 856 | 4 | |u http://dx.doi.org/10.1134/S1063784215120026 | |
| 942 | |c CF | ||