Sources of high power ion beams for technological applications; Vacuum; Vol. 42, iss. 1-2 (spec. iss.)

Sources of high power ion beams for technological applications; Vacuum; Vol. 42, iss. 1-2 (spec. iss.)

Dettagli Bibliografici
Parent link:Vacuum
Vol. 42, iss. 1-2 (spec. iss.).— 1991.— [P. 159–162]
Altri autori: Isakov I. F., Kolodii V. N., Opekunov M. S., Matvienko V. M., Pechenkin S. A., Remnev (Remnyov) G. E. Gennady Efimovich, Usov Y. P. Yuri Petrovich
Riassunto:Title screen
This report describes two sources of high power ion beams of nanosecond duration. The first one produces ions with energy up to 125 keV, pulse duration from 20 to 200 ns, current density for heavy ions (Al+, Mg+, Fe+, W+, etc.) 1-2 A cm−2 and energy of 12 to 120 J deposited by the beam. The second one produces, respectively, 300 keV, 50 ns, 40 to 200 A cm−2 current of H+ and C+ ions and a kJ energy. The sources are powered by various diode systems and can be applied to scientific research and technology for materials science.
Режим доступа: по договору с организацией-держателем ресурса
Lingua:inglese
Pubblicazione: 1991
Soggetti:
электронный ресурс
труды учёных ТПУ
Accesso online:http://dx.doi.org/10.1016/0042-207X(91)90101-N
Natura: Elettronico Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645363

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