Sources of high power ion beams for technological applications
| Parent link: | Vacuum Vol. 42, iss. 1-2 (spec. iss.).— 1991.— [P. 159–162] |
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| Other Authors: | , , , , , , |
| Summary: | Title screen This report describes two sources of high power ion beams of nanosecond duration. The first one produces ions with energy up to 125 keV, pulse duration from 20 to 200 ns, current density for heavy ions (Al+, Mg+, Fe+, W+, etc.) 1-2 A cm−2 and energy of 12 to 120 J deposited by the beam. The second one produces, respectively, 300 keV, 50 ns, 40 to 200 A cm−2 current of H+ and C+ ions and a kJ energy. The sources are powered by various diode systems and can be applied to scientific research and technology for materials science. Режим доступа: по договору с организацией-держателем ресурса |
| Published: |
1991
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.1016/0042-207X(91)90101-N |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645363 |
| Summary: | Title screen This report describes two sources of high power ion beams of nanosecond duration. The first one produces ions with energy up to 125 keV, pulse duration from 20 to 200 ns, current density for heavy ions (Al+, Mg+, Fe+, W+, etc.) 1-2 A cm−2 and energy of 12 to 120 J deposited by the beam. The second one produces, respectively, 300 keV, 50 ns, 40 to 200 A cm−2 current of H+ and C+ ions and a kJ energy. The sources are powered by various diode systems and can be applied to scientific research and technology for materials science. Режим доступа: по договору с организацией-держателем ресурса |
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| DOI: | 10.1016/0042-207X(91)90101-N |