A high-current impulse implanter; Instruments and Experimental Techniques; Vol. 58, iss. 5/1
| Parent link: | Instruments and Experimental Techniques.— , 1956- Vol. 58, iss. 5/1.— 2015.— [P. 708-710] |
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| 第一著者: | |
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| その他の著者: | , |
| 要約: | Title screen A high-current impulse implanter on the basis of a high-current ion diode with a radial magnetic field and preliminary plasma production is described. Plasma is formed at the diode anode using a negative voltage pulse that precedes an accelerating-voltage pulse. The pause between pulses is 500 ± 50 ns. Graphite is used as the emission coating on the anode. An ion beam with a current density in the diode focal plane of up to 80 A/cm2 was obtained. Analysis of the elemental composition of the ion beam using the time-of-flight technique showed that the ion beam consists mainly of С+and С+2 carbon ions and Н+ protons. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
| 出版事項: |
2015
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| オンライン･アクセス: | http://dx.doi.org/10.1134/S0020441215040247 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645173 |