Bayazitov R. M., Zakirzyanova L. Kh., Khaibullin I. B., & Remnev G. E. Gennady Efimovich. (1997). Formation of heavily doped semiconductor layers by pulsed ion beam treatmen. 1997. https://doi.org/10.1016/S0168-583X(96)00637-4
Chicago Style (17th ed.) CitationBayazitov R. M., Zakirzyanova L. Kh., Khaibullin I. B., and Remnev G. E. Gennady Efimovich. Formation of Heavily Doped Semiconductor Layers by Pulsed Ion Beam Treatmen. 1997, 1997. https://doi.org/10.1016/S0168-583X(96)00637-4.
MLA (9th ed.) CitationBayazitov R. M., et al. Formation of Heavily Doped Semiconductor Layers by Pulsed Ion Beam Treatmen. 1997, 1997. https://doi.org/10.1016/S0168-583X(96)00637-4.
Warning: These citations may not always be 100% accurate.