Role of Crystallographic Anisotropy in the Formation of Surface Layers of Single NiTi Crystals after Ion-Plasma Alloying
| Parent link: | AIP Conference Proceedings Vol. 1683 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures.— 2015.— [020184, 4 p.] |
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| Institution som forfatter: | Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ) |
| Andre forfattere: | Poletika T. M., Meisner L. L., Girsova S. L., Meisner S. N., Shulepov I. A. Ivan Anisimovich |
| Summary: | Title screen The structure of the surface and near-surface layers of single crystals of NiTi, differently oriented relative to the direction of ion beam treatment was investigated. The role of the crystallographic orientation in formation of structure of surface layers after ion-plasma alloying was revealed. It was found that the orientation effects of selective sputtering and channeling determine the thickness of the oxide and amorphous layers, the depth of penetration of ions and impurities, the distribution of Ni with depth. Режим доступа: по договору с организацией-держателем ресурса |
| Sprog: | engelsk |
| Udgivet: |
2015
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| Fag: | |
| Online adgang: | http://dx.doi.org/10.1063/1.4932874 |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644993 |
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