Magnetron deposition of TCO films using ion beam; Journal of Physics: Conference Series; Vol. 652 : Gas Discharge Plasmas and Their Applications (GDP 2015)
| Parent link: | Journal of Physics: Conference Series Vol. 652 : Gas Discharge Plasmas and Their Applications (GDP 2015).— 2015.— [012046, 4 p.] |
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| المؤلف الرئيسي: | |
| مؤلف مشترك: | |
| مؤلفون آخرون: | , |
| الملخص: | Title screen Thin films of tin oxide (TO) were deposited on the glass substrates at room temperature using reactive magnetron sputtering at various oxygen partial pressures. After the deposition the films were irradiated with argon ions beam. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties in the range of 300-1100 nm were investigated by photometry as well as their structural properties were studied using X-ray diffraction. Diffractometric research showed that the films, deposited on a substrate, have a crystal structure, and after argon ions irradiation they become quasi-crystalline (amorphous). It was found that the transmission increases proportionally with the irradiation time, but the surface resistance -disproportionally. Режим доступа: по договору с организацией-держателем ресурса |
| اللغة: | الإنجليزية |
| منشور في: |
2015
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://dx.doi.org/10.1088/1742-6596/652/1/012046 http://earchive.tpu.ru/handle/11683/18225 |
| التنسيق: | الكتروني فصل الكتاب |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644620 |