Accumulation of macroparticles on a substrate in vacuum arc titanium plasma; Известия вузов. Физика; Т. 57, № 12, ч. 3
| Parent link: | Известия вузов. Физика: научный журнал.— , 1957- Т. 57, № 12, ч. 3.— 2014.— [С. 254-258] |
|---|---|
| Corporate Authors: | Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22, Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ), Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электрических сетей и электротехники (ЭСиЭ) |
| Other Authors: | Ryabchikov A. I. Aleksandr Ilyich, Sivin D. O. Denis Olegovich, Bumagina A. I. Anna Ivanovna, Tupikova O. S. Olga Sergeevna, Shevelev A. E. Aleksey Eduardovich, Usov Y. P. Yuri Petrovich |
| Summary: | Заглавие с экрана We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f =10 5 p.p.s., ? b = -2 kV and ? = 7 µs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation. Режим доступа: по договору с организацией-держателем ресурса |
| Language: | English |
| Published: |
2014
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| Subjects: | |
| Online Access: | http://elibrary.ru/item.asp?id=23815794 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643630 |
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