Accumulation of macroparticles on a substrate in vacuum arc titanium plasma
| Parent link: | Известия вузов. Физика: научный журнал.— , 1957- Т. 57, № 12, ч. 3.— 2014.— [С. 254-258] |
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| Körperschaften: | , , |
| Weitere Verfasser: | , , , , , |
| Zusammenfassung: | Заглавие с экрана We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f =10 5 p.p.s., ? b = -2 kV and ? = 7 µs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation. Режим доступа: по договору с организацией-держателем ресурса |
| Sprache: | Englisch |
| Veröffentlicht: |
2014
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| Schlagworte: | |
| Online-Zugang: | http://elibrary.ru/item.asp?id=23815794 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643630 |
MARC
| LEADER | 00000nla0a2200000 4500 | ||
|---|---|---|---|
| 001 | 643630 | ||
| 005 | 20250917142554.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\8625 | ||
| 090 | |a 643630 | ||
| 100 | |a 20150918d2014 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Accumulation of macroparticles on a substrate in vacuum arc titanium plasma |f A. I. Ryabchikov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Заглавие с экрана | ||
| 320 | |a [Библиогр.: с. 258 (22 назв.)] | ||
| 330 | |a We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f =10 5 p.p.s., ? b = -2 kV and ? = 7 µs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Известия вузов. Физика |o научный журнал |d 1957- | ||
| 463 | |t Т. 57, № 12, ч. 3 |v [С. 254-258] |d 2014 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a vacuum-arc | |
| 610 | 1 | |a metal plasma | |
| 610 | 1 | |a macroparticles | |
| 610 | 1 | |a negative high-frequency short-pulsed bias | |
| 610 | 1 | |a plasma immersion ion implantation | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Bumagina |b A. I. |c physicist |c Associate Scientist of Tomsk Polytechnic University |f 1987- |g Anna Ivanovna |3 (RuTPU)RU\TPU\pers\34326 |9 17835 | |
| 701 | 1 | |a Tupikova |b O. S. |c physicist |c engineer of Tomsk Polytechnic University |f 1988- |g Olga Sergeevna |3 (RuTPU)RU\TPU\pers\34527 |9 17908 | |
| 701 | 1 | |a Shevelev |b A. E. |c Physicist |c Engineer of Tomsk Polytechnic University |f 1990- |g Aleksey Eduardovich |3 (RuTPU)RU\TPU\pers\36832 |9 19861 | |
| 701 | 1 | |a Usov |b Y. P. |c Professor of Tomsk Polytechnic University, Electrical engineer, Doctor of Technical Sciences |f 1937- |g Yuri Petrovich |3 (RuTPU)RU\TPU\pers\28977 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Лаборатория № 22 |3 (RuTPU)RU\TPU\col\19225 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Центр измерений свойств материалов (ЦИСМ) |3 (RuTPU)RU\TPU\col\19361 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Энергетический институт (ЭНИН) |b Кафедра электрических сетей и электротехники (ЭСиЭ) |3 (RuTPU)RU\TPU\col\18677 |
| 801 | 2 | |a RU |b 63413507 |c 20160601 |g RCR | |
| 856 | 4 | |u http://elibrary.ru/item.asp?id=23815794 | |
| 942 | |c CF | ||