Accumulation of macroparticles on a substrate in vacuum arc titanium plasma; Известия вузов. Физика; Т. 57, № 12, ч. 3

Accumulation of macroparticles on a substrate in vacuum arc titanium plasma; Известия вузов. Физика; Т. 57, № 12, ч. 3

Detaylı Bibliyografya
Parent link:Известия вузов. Физика: научный журнал.— , 1957-
Т. 57, № 12, ч. 3.— 2014.— [С. 254-258]
Kurumsal yazarlar: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22, Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ), Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электрических сетей и электротехники (ЭСиЭ)
Diğer Yazarlar: Ryabchikov A. I. Aleksandr Ilyich, Sivin D. O. Denis Olegovich, Bumagina A. I. Anna Ivanovna, Tupikova O. S. Olga Sergeevna, Shevelev A. E. Aleksey Eduardovich, Usov Y. P. Yuri Petrovich
Özet:Заглавие с экрана
We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f =10 5 p.p.s., ? b = -2 kV and ? = 7 µs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.
Режим доступа: по договору с организацией-держателем ресурса
Dil:İngilizce
Baskı/Yayın Bilgisi: 2014
Konular:
электронный ресурс
труды учёных ТПУ
vacuum-arc
metal plasma
macroparticles
negative high-frequency short-pulsed bias
plasma immersion ion implantation
Online Erişim:http://elibrary.ru/item.asp?id=23815794
Materyal Türü: Elektronik Kitap Bölümü
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643630
Diğer Bilgiler
Özet:Заглавие с экрана
We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f =10 5 p.p.s., ? b = -2 kV and ? = 7 µs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.
Режим доступа: по договору с организацией-держателем ресурса

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