Национальный исследовательский Томский политехнический университет, Kozin K. A. Kirill Andreevich, Goryunov A. G. Aleksey Germanovich, Manenti F. Flavio, Rossi F. Francesco, & Stolpovsky A. E. Aleksey Evgenjevich. (2015). Development of an Advanced Control System for a ChemicalVapor Deposition (CVD) Reactor for Polysilicon Production; Chemical Engineering Transactions; Vol. 43. 2015. https://doi.org/10.3303/CET1543256
Chicago Style (17th ed.) CitationНациональный исследовательский Томский политехнический университет, Kozin K. A. Kirill Andreevich, Goryunov A. G. Aleksey Germanovich, Manenti F. Flavio, Rossi F. Francesco, and Stolpovsky A. E. Aleksey Evgenjevich. Development of an Advanced Control System for a ChemicalVapor Deposition (CVD) Reactor for Polysilicon Production; Chemical Engineering Transactions; Vol. 43. 2015, 2015. https://doi.org/10.3303/CET1543256.
MLA (9th ed.) CitationНациональный исследовательский Томский политехнический университет, et al. Development of an Advanced Control System for a ChemicalVapor Deposition (CVD) Reactor for Polysilicon Production; Chemical Engineering Transactions; Vol. 43. 2015, 2015. https://doi.org/10.3303/CET1543256.