Electrophysical properties of polycrystalline diamond films deposited from an abnormal glow discharge

Մատենագիտական մանրամասներ
Parent link:IOP Conference Series: Materials Science and Engineering
Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials.— 2015.— [012006, 6 p.]
Համատեղ հեղինակներ: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1, Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электроснабжения промышленных предприятий (ЭПП)
Այլ հեղինակներ: Gaydaychuk A. V. Alexander Valerievich, Kabyshev A. V. Alexander Vasilievich, Konusov F. V. Fedor Valerievich, Linnik S. A. Stepan Andreevich, Remnev G. E. Gennady Efimovich
Ամփոփում:Title screen
Electrophysical properties of polycrystalline diamond films (PDF), deposited from the abnormal glow discharge, were obtained. The energetic and kinetic characteristics of surface dark and photoconductivity of PDF and their temperature, field and spectral dependences were investigated. Dominant carrier transport mechanisms, their type and the energetic spectrum of localized defect states were established. Current-voltage characteristics, photosensitivity and activation energy are determined by conductivity of PDF, which varies from 10{-14} to 10{-4} S depending on deposition conditions. Vacuum annealing of films up to 600-800 K stabilizes the electrical characteristics. Thermal stability of PDF properties higher than semiconductor films, deposited under nonequilibrium conditions by pulsed laser and ion ablation. PDF films not inferior on properties to films, obtained by alternative CVD methods. Electrical characteristics, mechanism of charge transport of PDF were caused by defects of different nature, the energetic levels of which are continuously distributed on energy in the band gap. Dominant n-type of activation conduction is complemented by hopping mechanism through the localized states distributed near the Fermi level with density 5.6x10{17}-2.1x10{21} eV{-1} cm{-3}. Trapping and recombination centers are heterogeneously distributed on grain boundaries.
Режим доступа: по договору с организацией-держателем ресурса
Լեզու:անգլերեն
Հրապարակվել է: 2015
Խորագրեր:
Առցանց հասանելիություն:http://dx.doi.org/10.1088/1757-899X/81/1/012006
http://earchive.tpu.ru/handle/11683/14687
Ձևաչափ: Էլեկտրոնային Գրքի գլուխ
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=642939

MARC

LEADER 00000nla2a2200000 4500
001 642939
005 20240704063104.0
035 |a (RuTPU)RU\TPU\network\7927 
035 |a RU\TPU\network\7925 
090 |a 642939 
100 |a 20150825a2015 k y0engy50 ba 
101 0 |a eng 
102 |a GB 
105 |a y z 100zy 
135 |a drgn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a Electrophysical properties of polycrystalline diamond films deposited from an abnormal glow discharge  |f A. V. Gaydaychuk [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: 19 tit.] 
330 |a Electrophysical properties of polycrystalline diamond films (PDF), deposited from the abnormal glow discharge, were obtained. The energetic and kinetic characteristics of surface dark and photoconductivity of PDF and their temperature, field and spectral dependences were investigated. Dominant carrier transport mechanisms, their type and the energetic spectrum of localized defect states were established. Current-voltage characteristics, photosensitivity and activation energy are determined by conductivity of PDF, which varies from 10{-14} to 10{-4} S depending on deposition conditions. Vacuum annealing of films up to 600-800 K stabilizes the electrical characteristics. Thermal stability of PDF properties higher than semiconductor films, deposited under nonequilibrium conditions by pulsed laser and ion ablation. PDF films not inferior on properties to films, obtained by alternative CVD methods. Electrical characteristics, mechanism of charge transport of PDF were caused by defects of different nature, the energetic levels of which are continuously distributed on energy in the band gap. Dominant n-type of activation conduction is complemented by hopping mechanism through the localized states distributed near the Fermi level with density 5.6x10{17}-2.1x10{21} eV{-1} cm{-3}. Trapping and recombination centers are heterogeneously distributed on grain boundaries. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
337 |a Adobe Reader 
461 1 |0 (RuTPU)RU\TPU\network\2008  |t IOP Conference Series: Materials Science and Engineering 
463 1 |0 (RuTPU)RU\TPU\network\7891  |t Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials  |o International Scientific Conference, 3-8 November 2014, Tomsk, Russia  |o [proceedings]  |v [012006, 6 p.]  |d 2015 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a электрофизические свойства 
610 1 |a поликристаллические пленки 
610 1 |a тлеющие разряды 
701 1 |a Gaydaychuk  |b A. V.  |c physicist  |c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University  |f 1984-  |g Alexander Valerievich  |3 (RuTPU)RU\TPU\pers\32876  |9 16724 
701 1 |a Kabyshev  |b A. V.  |c specialist in the field of electric power engineering  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |f 1958-  |g Alexander Vasilievich  |3 (RuTPU)RU\TPU\pers\32572 
701 1 |a Konusov  |b F. V.  |c physicist  |c Lead Engineer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1958-  |g Fedor Valerievich  |y Tomsk  |3 (RuTPU)RU\TPU\pers\32570  |9 16491 
701 1 |a Linnik  |b S. A.  |c physicist  |c Engineer-Researcher of Tomsk Polytechnic University  |f 1985-  |g Stepan Andreevich  |3 (RuTPU)RU\TPU\pers\32877  |9 16725 
701 1 |a Remnev  |b G. E.  |c physicist  |c Professor of Tomsk Polytechnic University, Doctor of technical sciences  |f 1948-  |g Gennady Efimovich  |3 (RuTPU)RU\TPU\pers\31500 
712 0 2 |a Национальный исследовательский Томский политехнический университет (ТПУ)  |b Институт физики высоких технологий (ИФВТ)  |b Лаборатория № 1  |3 (RuTPU)RU\TPU\col\19035 
712 0 2 |a Национальный исследовательский Томский политехнический университет (ТПУ)  |b Энергетический институт (ЭНИН)  |b Кафедра электроснабжения промышленных предприятий (ЭПП)  |3 (RuTPU)RU\TPU\col\18676 
801 2 |a RU  |b 63413507  |c 20161212  |g RCR 
856 4 |u http://dx.doi.org/10.1088/1757-899X/81/1/012006 
856 4 |u http://earchive.tpu.ru/handle/11683/14687 
942 |c CF