Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam

Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam

Dades bibliogràfiques
Parent link:	IOP Conference Series: Materials Science and Engineering Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials.— 2015.— [012001, 5 p.]
Autor principal:	Umnov S. P. Sergey Pavlovich
Autor corporatiu:	Национальный исследовательский Томский политехнический университет
Altres autors:	Asainov O. Kh. Oleg Khaydarovich
Sumari:	Title screen Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic-force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties. Режим доступа: по договору с организацией-держателем ресурса
Publicat:	2015
Matèries:	электронный ресурс труды учёных ТПУ спектры пленки магнетронное распыление ионы аргона просвечивающая электронная микроскопия рентгеновская дифрактометрия
Accés en línia:	http://dx.doi.org/10.1088/1757-899X/81/1/012001 http://earchive.tpu.ru/handle/11683/14685
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=642935

Ítems similars

Influence irradiation argon ion SnO[2] on optical and electrical characteristics
per: Asainov O. Kh. Oleg Khaydarovich
Publicat: (2017)

Modification of optical and electrical properties of SnO[2] under the influence of argon ion beam
per: Umnov S. P. Sergey Pavlovich
Publicat: (2017)

Modification of optical and electrical pr operties Sn0[2] under the influence of argon ion beam
per: Umnov S. P. Sergey Pavlovich
Publicat: (2016)

Plasmodynamic Synthesis of Nanodispersed Silicon Carbide
Publicat: (2014)

Radiation-induced deposition of transparent conductive tin oxide coatings
per: Umnov S. P. Sergey Pavlovich
Publicat: (2016)

Зависимость состава продукта плазмодинамического синтеза в системе SI-C от давления среды камеры-реактора
per: Насырбаев А. Артур
Publicat: (2017)

Plasmadynamic synthesis of Ti-B nanopowders
Publicat: (2017)

Плазмодинамический синтез в системе SI-C-N-O
per: Насырбаев А. Артур
Publicat: (2018)

Разработка метода прямого плазмодинамического синтеза нанодисперсного оксида цинка для водородной энергетики
per: Циммерман А. И. Александр Игоревич
Publicat: (2017)

Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets
Publicat: (2018)

Multilayer chromium nitride/carbon coatings deposited by magnetron sputtering
per: Sidelev D. V. Dmitry Vladimirovich
Publicat: (2019)

Plasma dynamic synthesis of ultradispersed zinc oxide and sintering ceramics on its basis by SPS method
Publicat: (2017)

Changes in the Spectral Characteristics of Aluminum Films Deposited under Assisting Argon Ion Beam
Publicat: (2015)

Effect of Oxygen Concentration in a Gaseous Mixture with Argon on the Phase Composition of Plasmodynamic Synthesis Products in an Iron–Oxygen System
Publicat: (2017)

Дифракционные методы изучения материалов и приборных структур. Ионная имплантация
per: Бублик В. Т.
Publicat: (Москва, МИСИС, 2013)

Bias-assisted magnetron sputtering of yttria-stabilised zirconia thin films
Publicat: (2014)

Mononuclear bromide complexes of Sb(V): crystal structures and thermal behaviour
Publicat: (2018)

Polyhedral Graphite Particles Ambient Air Direct Current Arc Plasma Synthesis Supported by Molybdenum Catalyst
Publicat: (2020)

Применение рентгеновской дифрактометрии в промышленном НК
per: Фиала Я. Ярослав
Publicat: (2003)

Optical and AFM studies on p-SNS thin films deposited by magnetron sputtering
per: An V. V. Vladimir Vilorievich
Publicat: (2015)

Size effect in AlN/SiN multilayered films irradiated with helium and argon ions
Publicat: (2018)

Phase Transformations in Nanostructured Coatings Based on Zr-Y-O and Produced by a Pulse Magnetron Sputtering Method
per: Fedorishcheva M. V. Marina Vladimirovna
Publicat: (2015)

X-Ray Diffraction Analysis of the Influence of the Absorbed γ-Irradiation Dose on Ti3Al Structural Characteristics
Publicat: (2018)

Рентгеноструктурные исследования порошков гексаферрита стронция, синтезированных по криохимической технологии
per: Булатов М. Ф.
Publicat: (2011)

Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
per: Boytsova E. L. Elena Lvovna
Publicat: (2018)

Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering
Publicat: (2017)

The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering
Publicat: (2016)

Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties
Publicat: (2019)

High-rate deposition of chromium coatings by magnetron sputtering
Publicat: (2019)

Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit
Publicat: (2016)

Magnetron sputtering system
per: Lazarev A. V.
Publicat: (2015)

The Application of Radio Frequency Magnetron Sputtering for Fluoropolymer Surface Modification
per: Malchikhina A. I. Alena Igorevna
Publicat: (2014)

Medical nanofilms of titanium oxynitride deposited by reactive magnetron sputtering
per: Boytsova E. L. Elena Lvovna
Publicat: (2016)

Определение ОКР и среднего размера частиц карбида вольфрама WC[1-X]
per: Шатрова К. Н.
Publicat: (2014)

Characterzations of nitrogen-doped titanium dioxide films prepared by reactive magnetron sputtering deposition
per: Pichugin V. F. Vladimir Fyodorovich
Publicat: (2016)

Плазмодинамический синтез кубического карбида вольфрама и исследование влияния параметров газообразной среды
Publicat: (2021)

Radiation Stability of Triple Coatings Based on Transition-Metal Nitrides Under Irradiation By Alpha Particles and Argon Ions
Publicat: (2016)

О возможности динамического синтеза и прямого получения смесевых нанодисперсных сверхтвёрдых материалов
per: Сайгаш А. С. Анастасия Сергеевна
Publicat: (2008)

Preparation and Synthetic Applicability of Imidazole-Containing Cyclic Iodonium Salts
Publicat: (2021)

Nickel and Chromium Deposition by Hot Target Magnetron Sputtering
Publicat: (2019)