Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam; IOP Conference Series: Materials Science and Engineering; Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials
| Parent link: | IOP Conference Series: Materials Science and Engineering Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials.— 2015.— [012001, 5 p.] |
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| Özet: | Title screen Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic-force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties. Режим доступа: по договору с организацией-держателем ресурса |
| Dil: | İngilizce |
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2015
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| Online Erişim: | http://dx.doi.org/10.1088/1757-899X/81/1/012001 http://earchive.tpu.ru/handle/11683/14685 |
| Materyal Türü: | Elektronik Kitap Bölümü |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=642935 |
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| 200 | 1 | |a Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam |f S. P. Umnov, O. Kh. Asainov | |
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| 300 | |a Title screen | ||
| 320 | |a [References: 11 tit.] | ||
| 330 | |a Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic-force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
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| 461 | 1 | |0 (RuTPU)RU\TPU\network\2008 |t IOP Conference Series: Materials Science and Engineering | |
| 463 | 1 | |0 (RuTPU)RU\TPU\network\7891 |t Vol. 81 : Radiation-Thermal Effects and Processes in Inorganic Materials |o International Scientific Conference, 3-8 November 2014, Tomsk, Russia |o [proceedings] |v [012001, 5 p.] |d 2015 | |
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| 700 | 1 | |a Umnov |b S. P. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1957- |g Sergey Pavlovich |3 (RuTPU)RU\TPU\pers\34215 | |
| 701 | 1 | |a Asainov |b O. Kh. |c physicist |c Head of the laboratory of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1957- |g Oleg Khaydarovich |3 (RuTPU)RU\TPU\pers\34632 | |
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