Corrosion resistance of silicon-modified nitinol in artificial physiological solutions

Corrosion resistance of silicon-modified nitinol in artificial physiological solutions

Бібліографічні деталі
Parent link:Advanced Biomaterials and Devices in Medicine
Vol. 1, iss. 1.— 2014.— [P. 46-52]
Співавтор: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра общей и неорганической химии (ОНХ)
Інші автори: Lotkov A. I., Psakhie S. G. Sergey Grigorievich, Meisner L. L., Korshunov A. V. Andrey Vladimirovich, Meisner S. N., Diamant V. M.
Резюме:Title screen
Electrochemical methods were used to investigate the corrosion resistance of nitinol specimens modified with silicon by ion implantation (fluence 2  1017 ions/cm2). After ion beam treatment, nickel concentration in the surface layer is significantly reduced up to 20 nm deep and a silicon-containing layer is formed at the depth of 10...80 nm with the maximum concentration of 30 at % at the depth of 30...35 nm. The breakdown (pitting) potential Eb of such NiTi–Si specimens in 0.9% NaCl physiological solution and in artificial blood plasma is ~0.9 V (Ag/AgCl/ KCl sat.) which is much higher than Eb of test specimens subjected to mechanical, chemical or electrochemical treatment. It is shown that under potentiostatic conditions at Eb the NiTi–Si specimen surface is stable to failure and does not exhibit pitting, spotting or microcracking. The comparison of corrosion test results with the cyclic voltammetry data for NiTi, Ti and Ni as well as with thermodynamic calculations demonstrates that the surface of the modified NiTi–Si specimens has enhanced stability with respect to the release of nickel ions into solutions.
Опубліковано: 2014
Предмети:
электронный ресурс
труды учёных ТПУ
Онлайн доступ:http://abiodem.com/abstract.php?id=87
Формат: Електронний ресурс Частина з книги
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=642907

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