Influence of Bias Parameters and Plasma Density on Vacuum Arc Macroparticle Accumulation
| Parent link: | Materials and Manufacturing Processes.— , 1986- Vol. 30, iss. 12.— 2015.— [P. 1471-1475] |
|---|---|
| Autor principal: | |
| Outros Autores: | , |
| Resumo: | Title screen Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 µs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | inglês |
| Publicado em: |
2015
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| Assuntos: | |
| Acesso em linha: | http://dx.doi.org/10.1080/10426914.2015.1019094 |
| Formato: | Recurso Eletrônico Capítulo de Livro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=642889 |
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| 200 | 1 | |a Influence of Bias Parameters and Plasma Density on Vacuum Arc Macroparticle Accumulation |f A. I. Ryabchikov, D. O. Sivin, A. I. Bumagina | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (105 Hz, 7 µs, -0.5 kV to -3.5 kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 105/cm2 to 107/cm2, depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Materials and Manufacturing Processes |d 1986- | ||
| 463 | |t Vol. 30, iss. 12 |v [P. 1471-1475] |d 2015 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 700 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Bumagina |b A. I. |c physicist |c Associate Scientist of Tomsk Polytechnic University |f 1987- |g Anna Ivanovna |3 (RuTPU)RU\TPU\pers\34326 |9 17835 | |
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