The effect of Si content on structure and mechanical features of silicon-containing calcium phosphorus-based films deposited by rf-magnetron sputtering on titanium substrate treated by pulsed electron beam
| Parent link: | The 9th International Forum on Strategic Techology (IFOST-2014), September 21-23, 2014, Cox's Bazar, Bangladesh.— 2014.— [3 p.] |
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| Corporate Authors: | , , , |
| Other Authors: | , , , , , , , , , |
| Summary: | Title screen Silicon-containing calcium phosphate (Si-CaP)coatings were fabricated by radio frequency (rf) magnetronsputtering of targets prepared from hydroxyapatite (HA) powderwith different silicon content. A powder of Si-HA(Ca[10](PO[4])[6-x](SiO[4])[x](OH)[2-x], x=0.5 and 1.72) was prepared bymechanochemical activation and then used as a precursorpowderto prepare a target for sputtering. The titanium substratewas acid etched and treated with pulsed electron beam with anenergy density of 15 J/cm{2}. The phase composition and structure,nanohardness and Young’s modulus of Si-CaP coating depositedon titanium substrate were investigated by X-ray diffraction andnanoindentation test, respectively. The average crystallite size asdetermined by XRD was 28 nm for coatings obtained bysputtering of the target prepared from the Si-HA powder (x=0.5),whereas Si-CaP (Si-HA powder x=1.72) films showed anamorphous structure. The nanohardness and the Young’smodulus of the Si-HA coating (x=0.5) deposited on titaniumtreated by pulsed electron beam treatment are enhanced to 4.5and 113 GPa compared to titanium substrate. Increase of Sicontent resulted in a dramatic reduction of the nanohardness andYoung’s modulus of Si-CaP films. However, Si-CaP with thehighest Si content exhibited significantly lower values of elasticmodulus, but slightly higher values of H/E and H[3]/E[2], than didthe non-coated specimens. Therefore, the structure of films has asignificant effect on tribological and mechanical properties of thedeposited coatings. Rf-magnetron sputtering allowed to produceSi-CaP coatings with higher nanohardness and lower elasticmodulus compared to titanium substrate. |
| Language: | English |
| Published: |
2014
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| Series: | Advanced Material & Nanotechnology Nano-Technology |
| Subjects: | |
| Online Access: | http://180.211.172.109/ifost2014Pro/pdf/S5-P53.pdf |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641721 |
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| 200 | 1 | |a The effect of Si content on structure and mechanical features of silicon-containing calcium phosphorus-based films deposited by rf-magnetron sputtering on titanium substrate treated by pulsed electron beam |f M. A. Surmeneva [et al.] | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a Advanced Material & Nanotechnology | |
| 225 | 1 | |a Nano-Technology | |
| 300 | |a Title screen | ||
| 320 | |a [References: 13 tit.] | ||
| 330 | |a Silicon-containing calcium phosphate (Si-CaP)coatings were fabricated by radio frequency (rf) magnetronsputtering of targets prepared from hydroxyapatite (HA) powderwith different silicon content. A powder of Si-HA(Ca[10](PO[4])[6-x](SiO[4])[x](OH)[2-x], x=0.5 and 1.72) was prepared bymechanochemical activation and then used as a precursorpowderto prepare a target for sputtering. The titanium substratewas acid etched and treated with pulsed electron beam with anenergy density of 15 J/cm{2}. The phase composition and structure,nanohardness and Young’s modulus of Si-CaP coating depositedon titanium substrate were investigated by X-ray diffraction andnanoindentation test, respectively. The average crystallite size asdetermined by XRD was 28 nm for coatings obtained bysputtering of the target prepared from the Si-HA powder (x=0.5),whereas Si-CaP (Si-HA powder x=1.72) films showed anamorphous structure. The nanohardness and the Young’smodulus of the Si-HA coating (x=0.5) deposited on titaniumtreated by pulsed electron beam treatment are enhanced to 4.5and 113 GPa compared to titanium substrate. Increase of Sicontent resulted in a dramatic reduction of the nanohardness andYoung’s modulus of Si-CaP films. However, Si-CaP with thehighest Si content exhibited significantly lower values of elasticmodulus, but slightly higher values of H/E and H[3]/E[2], than didthe non-coated specimens. Therefore, the structure of films has asignificant effect on tribological and mechanical properties of thedeposited coatings. Rf-magnetron sputtering allowed to produceSi-CaP coatings with higher nanohardness and lower elasticmodulus compared to titanium substrate. | ||
| 337 | |a Adobe Reader | ||
| 463 | 0 | |0 (RuTPU)RU\TPU\network\6394 |t The 9th International Forum on Strategic Techology (IFOST-2014), September 21-23, 2014, Cox's Bazar, Bangladesh |o [proceedings] |v [3 p.] |d 2014 | |
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| 610 | 1 | |a фосфат кальция | |
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| 610 | 1 | |a кремний | |
| 610 | 1 | |a пленки | |
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| 701 | 1 | |a Surmeneva |b M. A. |c specialist in the field of material science |c engineer-researcher of Tomsk Polytechnic University, Associate Scientist |f 1984- |g Maria Alexandrovna |3 (RuTPU)RU\TPU\pers\31894 |9 15966 | |
| 701 | 1 | |a Surmenev |b R. A. |c physicist |c Associate Professor of Tomsk Polytechnic University, Senior researcher, Candidate of physical and mathematical sciences |f 1982- |g Roman Anatolievich |3 (RuTPU)RU\TPU\pers\31885 |9 15957 | |
| 701 | 1 | |a Tyurin |b A. I. | |
| 701 | 1 | |a Mukhametkaliev |b T. M. |c physicist |c research engineer at Tomsk Polytechnic University |f 1991- |g Timur Mukhamedrashidovich |3 (RuTPU)RU\TPU\pers\34243 |9 17774 | |
| 701 | 1 | |a Teresov |b A. D. | |
| 701 | 1 | |a Koval |b N. N. |c specialist in the field of electronics |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Nikolay Nikolaevich |3 (RuTPU)RU\TPU\pers\34748 | |
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| 701 | 1 | |a Shuvarin |b I. A. | |
| 701 | 1 | |a Chudinova |b E. A. |c physicist |c laboratory assistant of Tomsk Polytechnic University |f 1993- |g Ekaterina Aleksandrovna |3 (RuTPU)RU\TPU\pers\34765 | |
| 701 | 1 | |a Syrtanov |b M. S. |c physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1990- |g Maksim Sergeevich |3 (RuTPU)RU\TPU\pers\34764 |9 18114 | |
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