Influence of Crystal Defects on the Reflectivity of the Aluminum

ग्रंथसूची विवरण
Parent link:Applied Mechanics and Materials: Scientific Journal
Vol. 756 : Mechanical Engineering, Automation and Control Systems (MEACS2014).— 2015.— [P. 164-168]
मुख्य लेखक: Umnov S. P. Sergey Pavlovich
निगमित लेखक: Национальный исследовательский Томский политехнический университет
अन्य लेखक: Asainov O. Kh. Oleg Khaydarovich, Lemachko A. N.
सारांश:Title screen
The effect of ion-assisted deposition of the Al films on their UV reflectance is investigated in this paper. The films' reflectance is measured by a spectrophotometer. The obtained films are examined by using transmission electron microscopy (TEM), X-ray diffraction analysis (XRD), and atomic force microscopy (AFM). The TEM and AFM measurements allow the determination of the size of crystallites in a film and its microstructure. The XRD analysis reveals that the films deposited with argon ion-beam assist are characterized by much higher microstress levels compared to the films deposited without ion assist. The comparison of the Al films’ reflectance measurements indicate that the films with a higher microstress level (hence, higher defect concentration) are characterized by the enhanced reflectance in the UV region. The conducted investigation shows that the defects of the Al films’ crystalline structure affect its optical properties.
Режим доступа: по договору с организацией-держателем ресурса
भाषा:अंग्रेज़ी
प्रकाशित: 2015
श्रृंखला:Material Engineering and Technologies
विषय:
ऑनलाइन पहुंच:http://dx.doi.org/10.4028/www.scientific.net/AMM.756.164
स्वरूप: इलेक्ट्रोनिक पुस्तक अध्याय
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641302

MARC

LEADER 00000nla2a2200000 4500
001 641302
005 20250513160304.0
035 |a (RuTPU)RU\TPU\network\6202 
035 |a RU\TPU\network\6199 
090 |a 641302 
100 |a 20150515a2015 k y0engy50 ba 
101 0 |a eng 
105 |a y z 100zy 
135 |a drcn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a Influence of Crystal Defects on the Reflectivity of the Aluminum  |f S. P. Umnov, O. Kh Asainov, A. N. Lemachko 
203 |a Text  |c electronic 
225 1 |a Material Engineering and Technologies 
300 |a Title screen 
330 |a The effect of ion-assisted deposition of the Al films on their UV reflectance is investigated in this paper. The films' reflectance is measured by a spectrophotometer. The obtained films are examined by using transmission electron microscopy (TEM), X-ray diffraction analysis (XRD), and atomic force microscopy (AFM). The TEM and AFM measurements allow the determination of the size of crystallites in a film and its microstructure. The XRD analysis reveals that the films deposited with argon ion-beam assist are characterized by much higher microstress levels compared to the films deposited without ion assist. The comparison of the Al films’ reflectance measurements indicate that the films with a higher microstress level (hence, higher defect concentration) are characterized by the enhanced reflectance in the UV region. The conducted investigation shows that the defects of the Al films’ crystalline structure affect its optical properties. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 0 |0 (RuTPU)RU\TPU\network\5920  |t Applied Mechanics and Materials  |o Scientific Journal 
463 0 |0 (RuTPU)RU\TPU\network\6028  |t Vol. 756 : Mechanical Engineering, Automation and Control Systems (MEACS2014)  |o International Conference, 16‐18 October, 2014, Tomsk, Russia  |o [proceedings]  |f National Research Tomsk Polytechnic University (TPU)  |v [P. 164-168]  |d 2015 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a дефекты 
610 1 |a кристаллические решетки 
610 1 |a магнетронное распыление 
610 1 |a коэффициенты отражения 
700 1 |a Umnov  |b S. P.  |c physicist  |c Senior researcher of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1957-  |g Sergey Pavlovich  |3 (RuTPU)RU\TPU\pers\34215 
701 1 |a Asainov  |b O. Kh.  |c physicist  |c Head of the laboratory of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1957-  |g Oleg Khaydarovich  |3 (RuTPU)RU\TPU\pers\34632 
701 1 |a Lemachko  |b A. N. 
712 0 2 |a Национальный исследовательский Томский политехнический университет  |c (2009- )  |9 26305 
801 2 |a RU  |b 63413507  |c 20161229  |g RCR 
850 |a 63413507 
856 4 |u http://dx.doi.org/10.4028/www.scientific.net/AMM.756.164 
942 |c CF