Microstructural Changes in Co Films Depending on MOCVD Conditions

Microstructural Changes in Co Films Depending on MOCVD Conditions

Bibliographic Details
Parent link:Advanced Materials Research: Scientific Journal
Vol. 1085 : Prospects of Fundamental Sciences Development (PFSD-2014).— 2015.— [P. 12-16]
Main Author: Hairullin (Khayrullin) R. R. Rustam Ravilievich
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра материаловедения в машиностроении (ММС)
Other Authors: Dorovskikh S.
Summary:Title screen
In this work the effect of substrate and vaporization temperatures on the structural parameters (sizes of coherent scattering region, values of strain), phase and chemical composition, surface morphology of Co films is revealed. Co films were deposited on Si (100) substrates by Metal-organic chemical vapor deposition using the diiminate complex Co (N’acN’ac)2 as a precursor. The sizes of coherent scattering region, values of strain and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by scanning electron microscope. It is found that the variation of deposition conditions allows us widely to change structural parameters and chemical composition of Co films.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2015
Series:Chemistry and Physics of Materials, Environmental Materials
Subjects:
электронный ресурс
труды учёных ТПУ
химический состав
морфология
поверхности
испарения
микроструктурные изменения
пленки
Online Access:http://dx.doi.org/10.4028/www.scientific.net/AMR.1085.12
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641143

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