Microstructural Changes in Co Films Depending on MOCVD Conditions; Advanced Materials Research; Vol. 1085 : Prospects of Fundamental Sciences Development (PFSD-2014)
| Parent link: | Advanced Materials Research: Scientific Journal Vol. 1085 : Prospects of Fundamental Sciences Development (PFSD-2014).— 2015.— [P. 12-16] |
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| Tác giả chính: | |
| Tác giả của công ty: | |
| Tác giả khác: | |
| Tóm tắt: | Title screen In this work the effect of substrate and vaporization temperatures on the structural parameters (sizes of coherent scattering region, values of strain), phase and chemical composition, surface morphology of Co films is revealed. Co films were deposited on Si (100) substrates by Metal-organic chemical vapor deposition using the diiminate complex Co (N’acN’ac)2 as a precursor. The sizes of coherent scattering region, values of strain and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by scanning electron microscope. It is found that the variation of deposition conditions allows us widely to change structural parameters and chemical composition of Co films. Режим доступа: по договору с организацией-держателем ресурса |
| Ngôn ngữ: | Tiếng Anh |
| Được phát hành: |
2015
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| Loạt: | Chemistry and Physics of Materials, Environmental Materials |
| Những chủ đề: | |
| Truy cập trực tuyến: | http://dx.doi.org/10.4028/www.scientific.net/AMR.1085.12 |
| Định dạng: | Điện tử Chương của sách |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641143 |
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