The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014)

Detalhes bibliográficos
Parent link:Advanced Materials Research: Scientific Journal
Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014).— 2014.— [P. 748-752]
Autor principal: Sidelev D. V. Dmitry Vladimirovich
Autor Corporativo: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра водородной энергетики и плазменных технологий (ВЭПТ)
Outros Autores: Yuriev Yu. N. Yuri Nikolaevich
Resumo:Title screen
The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O[2]) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O[2] flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O[2]) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (lambda=632.8 nm) methods, have strong dependence on Q(O[2]).
Режим доступа: по договору с организацией-держателем ресурса
Idioma:inglês
Publicado em: 2014
Colecção:Technologies of Electrophysical Methods of Materials Treatment
Assuntos:
Acesso em linha:http://dx.doi.org/10.4028/www.scientific.net/AMR.1040.748
Formato: Recurso Electrónico Capítulo de Livro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641110

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