The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014)

The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014)

Bibliographic Details
Parent link:Advanced Materials Research: Scientific Journal
Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014).— 2014.— [P. 748-752]
Main Author: Sidelev D. V. Dmitry Vladimirovich
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра водородной энергетики и плазменных технологий (ВЭПТ)
Other Authors: Yuriev Yu. N. Yuri Nikolaevich
Summary:Title screen
The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O[2]) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O[2] flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O[2]) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (lambda=632.8 nm) methods, have strong dependence on Q(O[2]).
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2014
Series:Technologies of Electrophysical Methods of Materials Treatment
Subjects:
электронный ресурс
труды учёных ТПУ
магнетронное распыление
реактивное распыление
тонкие пленки
Online Access:http://dx.doi.org/10.4028/www.scientific.net/AMR.1040.748
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641110

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