Sidelev D. V. Dmitry Vladimirovich & Yuriev Yu. N. Yuri Nikolaevich. (2014). The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040: High Technology: Research and Applications 2014 (HTRA 2014). 2014. https://doi.org/10.4028/www.scientific.net/AMR.1040.748
Cytowanie według stylu Chicago (wyd. 17)Sidelev D. V. Dmitry Vladimirovich i Yuriev Yu. N. Yuri Nikolaevich. The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040: High Technology: Research and Applications 2014 (HTRA 2014). 2014, 2014. https://doi.org/10.4028/www.scientific.net/AMR.1040.748.
Cytowanie według stylu MLA (wyd. 9)Sidelev D. V. Dmitry Vladimirovich i Yuriev Yu. N. Yuri Nikolaevich. The Reactive Deposition of TiO[x] Thin Films; Advanced Materials Research; Vol. 1040: High Technology: Research and Applications 2014 (HTRA 2014). 2014, 2014. https://doi.org/10.4028/www.scientific.net/AMR.1040.748.