Effect of Magnetic Field Configuration of Dual Magnetron on Carbon Based Films Properties

Effect of Magnetic Field Configuration of Dual Magnetron on Carbon Based Films Properties

Bibliographische Detailangaben
Parent link:Advanced Materials Research: Scientific Journal
Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014).— 2014.— [P. 721-725]
Körperschaft: Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра водородной энергетики и плазменных технологий
Weitere Verfasser: Yuriev Yu. N. Yuri Nikolaevich, Zaitsev D. A. Danila Aleksandrovich, Sidelev D. V. Dmitry Vladimirovich, Tupikova O. S. Olga Sergeevna
Zusammenfassung:Title screen
The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.
Режим доступа: по договору с организацией-держателем ресурса
Sprache:Englisch
Veröffentlicht: 2014
Schriftenreihe:Technologies of Electrophysical Methods of Materials Treatment
Schlagworte:
электронный ресурс
труды учёных ТПУ
магнетронные напыления
углерод
магнитные поля
Online-Zugang:http://dx.doi.org/10.4028/www.scientific.net/AMR.1040.721
Format: Elektronisch Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641105

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