Effect of Magnetic Field Configuration of Dual Magnetron on Carbon Based Films Properties; Advanced Materials Research; Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014)
| Parent link: | Advanced Materials Research: Scientific Journal Vol. 1040 : High Technology: Research and Applications 2014 (HTRA 2014).— 2014.— [P. 721-725] |
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| Institution som forfatter: | |
| Andre forfattere: | , , , |
| Summary: | Title screen The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures. Режим доступа: по договору с организацией-держателем ресурса |
| Sprog: | engelsk |
| Udgivet: |
2014
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| Serier: | Technologies of Electrophysical Methods of Materials Treatment |
| Fag: | |
| Online adgang: | http://dx.doi.org/10.4028/www.scientific.net/AMR.1040.721 |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641105 |