Development of New Ion and Plasma Surface Modification Methods; Advanced Materials Research : Radiation and nuclear techniques in material science; Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014)

Development of New Ion and Plasma Surface Modification Methods; Advanced Materials Research : Radiation and nuclear techniques in material science; Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014)

Bibliographic Details
Parent link:Advanced Materials Research : Radiation and nuclear techniques in material science: Scientific Journal
Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014).— 2015.— [P. 221-224]
Main Author: Ryabchikov A. I. Aleksandr Ilyich
Corporate Authors: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22, Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ), Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра теоретической и экспериментальной физики (ТиЭФ)
Other Authors: Sivin D. O. Denis Olegovich, Stepanov I. B. Igor Borisovich
Summary:Title screen
The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and the method of coating deposition and ion implantation, including an application of the filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10–99 %.
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2015
Series:Plasma, Microwave, Ion, Electron and Isotope Technologies
Subjects:
электронный ресурс
труды учёных ТПУ
металлы
плазма
смещения
поверхности
Online Access:http://dx.doi.org/10.4028/www.scientific.net/AMR.1084.221
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=640295

Similar Items

Similar Items