Development of New Ion and Plasma Surface Modification Methods; Advanced Materials Research : Radiation and nuclear techniques in material science; Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014)
| Parent link: | Advanced Materials Research : Radiation and nuclear techniques in material science: Scientific Journal Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014).— 2015.— [P. 221-224] |
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| Κύριος συγγραφέας: | |
| Συλλογικό Έργο: | , , |
| Άλλοι συγγραφείς: | , |
| Περίληψη: | Title screen The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and the method of coating deposition and ion implantation, including an application of the filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10–99 %. Режим доступа: по договору с организацией-держателем ресурса |
| Γλώσσα: | Αγγλικά |
| Έκδοση: |
2015
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| Σειρά: | Plasma, Microwave, Ion, Electron and Isotope Technologies |
| Θέματα: | |
| Διαθέσιμο Online: | http://dx.doi.org/10.4028/www.scientific.net/AMR.1084.221 |
| Μορφή: | Ηλεκτρονική πηγή Κεφάλαιο βιβλίου |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=640295 |
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| 200 | 1 | |a Development of New Ion and Plasma Surface Modification Methods |f A. I. Ryabchikov, D. O. Sivin, I. B. Stepanov | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a Plasma, Microwave, Ion, Electron and Isotope Technologies | |
| 300 | |a Title screen | ||
| 330 | |a The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and the method of coating deposition and ion implantation, including an application of the filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10–99 %. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |0 (RuTPU)RU\TPU\network\4598 |t Advanced Materials Research : Radiation and nuclear techniques in material science |o Scientific Journal | |
| 463 | 1 | |0 (RuTPU)RU\TPU\network\4600 |t Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014) |o The VIth International Conference, June 5-7, 2014, Tomsk, Russia |o [proceedings] |f National Research Tomsk Polytechnic University (TPU) |v [P. 221-224] |d 2015 | |
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