Low Pressure Discharge Characteristics in a Large Sized Hollow Cathode
Parent link: | Advanced Materials Research : Radiation and nuclear techniques in material science: Scientific Journal Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014).— 2015.— [P. 196-199] |
---|---|
अन्य लेखक: | , , , |
सारांश: | Title screen This work presents the experimental and theoretical research of low pressure discharge characteristics in a large sized hollow cathode using treated work pieces. The dependence of discharge voltage on gas pressure and system geometry has been obtained. It is demonstrated that the high plasma homogeneity with concentration up to 10{12} cm{2} and plasma temperature within the order of 1 eV is obtained. It is shown that the external discharge current enables the independent control of discharge current and its voltage. Режим доступа: по договору с организацией-держателем ресурса |
भाषा: | अंग्रेज़ी |
प्रकाशित: |
2015
|
श्रृंखला: | Plasma, Microwave, Ion, Electron and Isotope Technologies |
विषय: | |
ऑनलाइन पहुंच: | http://dx.doi.org/10.4028/www.scientific.net/AMR.1084.196 |
स्वरूप: | इलेक्ट्रोनिक पुस्तक अध्याय |
KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=640284 |
MARC
LEADER | 00000nla2a2200000 4500 | ||
---|---|---|---|
001 | 640284 | ||
005 | 20231101134115.0 | ||
035 | |a (RuTPU)RU\TPU\network\4830 | ||
035 | |a RU\TPU\network\4827 | ||
090 | |a 640284 | ||
100 | |a 20150414a2015 k y0engy50 ba | ||
101 | 0 | |a eng | |
105 | |a y z 100zy | ||
135 | |a drcn ---uucaa | ||
181 | 0 | |a i | |
182 | 0 | |a b | |
200 | 1 | |a Low Pressure Discharge Characteristics in a Large Sized Hollow Cathode |f T. V. Koval [et al.] | |
203 | |a Text |c electronic | ||
225 | 1 | |a Plasma, Microwave, Ion, Electron and Isotope Technologies | |
300 | |a Title screen | ||
330 | |a This work presents the experimental and theoretical research of low pressure discharge characteristics in a large sized hollow cathode using treated work pieces. The dependence of discharge voltage on gas pressure and system geometry has been obtained. It is demonstrated that the high plasma homogeneity with concentration up to 10{12} cm{2} and plasma temperature within the order of 1 eV is obtained. It is shown that the external discharge current enables the independent control of discharge current and its voltage. | ||
333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
461 | 1 | |0 (RuTPU)RU\TPU\network\4598 |t Advanced Materials Research : Radiation and nuclear techniques in material science |o Scientific Journal | |
463 | 1 | |0 (RuTPU)RU\TPU\network\4600 |t Vol. 1084 : Physical-Technical Problems of Nuclear Science, Energy Generation, and Power Industry (PTPAI -2014) |o The VIth International Conference, June 5-7, 2014, Tomsk, Russia |o [proceedings] |f National Research Tomsk Polytechnic University (TPU) |v [P. 196-199] |d 2015 | |
610 | 1 | |a электронный ресурс | |
610 | 1 | |a труды учёных ТПУ | |
610 | 1 | |a тлеющие разряды | |
610 | 1 | |a полые катоды | |
610 | 1 | |a разряды низкого давления | |
610 | 1 | |a плазма | |
610 | 1 | |a температура | |
701 | 1 | |a Koval |b T. V. |c mathematician, physicist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |f 1953- |g Tamara Vasilievna |2 stltpush |3 (RuTPU)RU\TPU\pers\34227 | |
701 | 1 | |a Lopatin |b I. V. | |
701 | 0 | |a Nguyen Bao Khyng |c Vietnamese specialist in the field of Informatics and computer engineering |c assistant Professor of Tomsk Polytechnic University |2 stltpush |3 (RuTPU)RU\TPU\pers\35433 | |
701 | 1 | |a Ogorodnikov |b A. S. |c specialist in the field of informatics and computer technology |c Associate Professor of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1947- |g Aleksander Sergeevich |2 stltpush |3 (RuTPU)RU\TPU\pers\31497 | |
712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Институт кибернетики (ИК) |b Кафедра прикладной математики (ПМ) |h 130 |2 stltpush |3 (RuTPU)RU\TPU\col\18700 |
801 | 2 | |a RU |b 63413507 |c 20161228 |g RCR | |
856 | 4 | |u http://dx.doi.org/10.4028/www.scientific.net/AMR.1084.196 | |
942 | |c CF |