Properties of the copper surface layers treated by volume gas discharge at atmospheric preassure; Mechanical Engineering, Automation and Control Systems (MEACS)
| Parent link: | Mechanical Engineering, Automation and Control Systems (MEACS).— 2014.— [4 p.] |
|---|---|
| Κύριος συγγραφέας: | |
| Συγγραφή απο Οργανισμό/Αρχή: | |
| Άλλοι συγγραφείς: | , |
| Περίληψη: | Title screen This paper presents new experimental data on the properties of the near-surface layers of copper specimens treated by plasma of diffuse discharge. A runaway electron preionized diffuse discharge was formed in air, nitrogen and carbon dioxide at atmospheric pressure by applying of nanosecond high voltage pulses to electrode of small curvature radius. The cleaning from carbon in comparison to the initial sample was observed at a depth exceeding 55 nm. The oxygen concentration was also significantly increased in comparison to that in the initial sample at a depth of up to about 25 nm. It is shown that the nanohardness of copper specimens increased due to interaction of near-surface layers with product of plasma chemical reactions produced in diffuse discharge. Режим доступа: по договору с организацией-держателем ресурса |
| Γλώσσα: | Αγγλικά |
| Έκδοση: |
2014
|
| Θέματα: | |
| Διαθέσιμο Online: | http://dx.doi.org/10.1109/MEACS.2014.6986949 |
| Μορφή: | Ηλεκτρονική πηγή Κεφάλαιο βιβλίου |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=639083 |
MARC
| LEADER | 00000nla2a2200000 4500 | ||
|---|---|---|---|
| 001 | 639083 | ||
| 005 | 20231101134038.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\3481 | ||
| 035 | |a RU\TPU\network\3477 | ||
| 090 | |a 639083 | ||
| 100 | |a 20150219a2014 k y0engy50 ba | ||
| 101 | 0 | |a eng | |
| 105 | |a a z 101zy | ||
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Properties of the copper surface layers treated by volume gas discharge at atmospheric preassure |f V. F. Tarasenko, M. Erofeev, M. Shulepov | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 16 tit.] | ||
| 330 | |a This paper presents new experimental data on the properties of the near-surface layers of copper specimens treated by plasma of diffuse discharge. A runaway electron preionized diffuse discharge was formed in air, nitrogen and carbon dioxide at atmospheric pressure by applying of nanosecond high voltage pulses to electrode of small curvature radius. The cleaning from carbon in comparison to the initial sample was observed at a depth exceeding 55 nm. The oxygen concentration was also significantly increased in comparison to that in the initial sample at a depth of up to about 25 nm. It is shown that the nanohardness of copper specimens increased due to interaction of near-surface layers with product of plasma chemical reactions produced in diffuse discharge. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 463 | 0 | |0 (RuTPU)RU\TPU\network\3200 |t Mechanical Engineering, Automation and Control Systems (MEACS) |o proceedings of the International Conference, Tomsk, 16-18 October, 2014 |f National Research Tomsk Polytechnic University (TPU) ; Institute of Electrical and Electronics Engineers (IEEE) |v [4 p.] |d 2014 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a pulsed gas discharge | |
| 610 | 1 | |a runaway electrons | |
| 610 | 1 | |a surface treatment | |
| 610 | 1 | |a импульсные разряды | |
| 610 | 1 | |a газы | |
| 610 | 1 | |a убегающие электроны | |
| 610 | 1 | |a поверхности | |
| 610 | 1 | |a поверхностные слои | |
| 610 | 1 | |a атмосферное давление | |
| 700 | 1 | |a Tarasenko |b V. F. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |f 1946- |g Victor Fedotovich |2 stltpush |3 (RuTPU)RU\TPU\pers\32090 | |
| 701 | 1 | |a Erofeev |b M. V. |c specialist in the field of oil and gas business |c Associate Professor of Tomsk Polytechnic University, Candidate of physical and mathematical sciences |f 1975- |g Mikhail Vladimirovich |2 stltpush |3 (RuTPU)RU\TPU\pers\34250 | |
| 701 | 1 | |a Shulepov |b M. | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Институт неразрушающего контроля (ИНК) |b Кафедра промышленной и медицинской электроники (ПМЭ) |h 64 |2 stltpush |3 (RuTPU)RU\TPU\col\18719 |
| 801 | 2 | |a RU |b 63413507 |c 20161227 |g RCR | |
| 856 | 4 | |u http://dx.doi.org/10.1109/MEACS.2014.6986949 | |
| 942 | |c CF | ||