The Effect of Substrate Temperature on the Structure and Magnetic Properties of Cobalt Films Deposited by CVD
| Parent link: | IOP Conference Series: Materials Science and Engineering Vol. 66: 20th International Conference for Students and Young Scientists: Modern Techniques and Technologies (MTT'2014), Tomsk, Russia, 14-18 April 2014.— 2014.— [012023, 5 p.] |
|---|---|
| מחבר ראשי: | |
| מחבר תאגידי: | |
| מחברים אחרים: | |
| סיכום: | Title screen In this work the effect of substrate temperature on the structural parameters (sizes of coherent scattering region, values of microstresses), phase and chemical composition, surface morphology of Co films is revealed. Moreover, the correlation between structure, cobalt content and magnetic, electrical characteristics of Co films is presented. Co films were deposited on Si (100) substrates by chemical vapor deposition using the diiminate complex Co(N'acN'ac)2 as a precursor. The sizes of coherent scattering region, values of microsresses and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by atomic-force microscope. Magnetic characteristics were measured by vibromagnetometer and the electrical resistivity was measured by four-probe dc method. It is found that the variation of deposition conditions allows widely changing structural parameters and chemical composition of Co films. Режим доступа: по договору с организацией-держателем ресурса |
| יצא לאור: |
2014
|
| נושאים: | |
| גישה מקוונת: | http://iopscience.iop.org/1757-899X/66/1/012023 http://dx.doi.org/10.1088/1757-899X/66/1/012023 |
| פורמט: | אלקטרוני Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=637823 |
| סיכום: | Title screen In this work the effect of substrate temperature on the structural parameters (sizes of coherent scattering region, values of microstresses), phase and chemical composition, surface morphology of Co films is revealed. Moreover, the correlation between structure, cobalt content and magnetic, electrical characteristics of Co films is presented. Co films were deposited on Si (100) substrates by chemical vapor deposition using the diiminate complex Co(N'acN'ac)2 as a precursor. The sizes of coherent scattering region, values of microsresses and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by atomic-force microscope. Magnetic characteristics were measured by vibromagnetometer and the electrical resistivity was measured by four-probe dc method. It is found that the variation of deposition conditions allows widely changing structural parameters and chemical composition of Co films. Режим доступа: по договору с организацией-держателем ресурса |
|---|---|
| DOI: | 10.1088/1757-899X/66/1/012023 |