Physical and chemical characteristics formation of multicomponent coatings in arc vapor deposition conditions; Известия вузов. Физика; Т. 55, № 12-2
| Parent link: | Известия вузов. Физика: научный журнал/ Национальный исследовательский Томский государственный университет (ТГУ).— , 1957- Т. 55, № 12-2.— 2012.— [С. 176-178] |
|---|---|
| প্রধান লেখক: | Kripakova M. V. Mariya Viktorovna |
| সংস্থা লেখক: | Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра физики высоких технологий в машиностроении (ФВТМ) |
| অন্যান্য লেখক: | Knyazeva A. G. Anna Georgievna, Goncharenko I. M. Igor Mihaylovich |
| সংক্ষিপ্ত: | Title screen Experimental data of the physical-mechanical characteristics for two systems hard nanocrystalline coatings TiAlN and TiAlSiN are presented. These coatings were deposited under similar condition on the steel sample 12Ch18N10T and the hard alloy sample WC-8. It was adjusted correlation between parameters W (the elastic recovery), H/E (the elastic failing deformation), H 3/E 2 (the material resistance to the plastic deformation). Also the mathematic model of the dynamic coating growth with movement boundary was constructed. Here is according to the experiment data [2], the growth rate of nitride coating corresponds to predetermined parameters of a vacuum-arc device. It is assumed that the rate of coating growth is determined by technological parameters due to the directed flux of aluminum and titanium or silicon positive ions from the cathode. Interstitial impurities penetrate plasma coating, thus nitride coating synthesis runs in the diffusion mode. Coating growth dynamics is described by one diffusion equation with different coefficients for the coating and the substrate. The task is calculated numerically and different schemes and variable time steps are used. Режим доступа: по договору с организацией-держателем ресурса |
| ভাষা: | ইংরেজি |
| প্রকাশিত: |
2012
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| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://elibrary.ru/item.asp?id=20133338 |
| বিন্যাস: | বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=637603 |
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অনুরূপ উপাদানগুলি
-
Influence of deposition conditions on mechanical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method; Surface and Coatings Technology; Vol. 349
প্রকাশিত: (2018) -
Conditions of non-traditional gold-platinum deposits formation; Mineral Deposits
অনুযায়ী: Korobeinikov A. F. Alexander Feopenovich
প্রকাশিত: (1995) -
Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method; Optik; Vol. 172
অনুযায়ী: Grenadyorov A. S. Aleksandr Sergeevich
প্রকাশিত: (2018) -
The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes; Metals; Vol. 7, iss. 11
প্রকাশিত: (2017) -
Coating deposition using vacuum arc and ablation metal plasma; Surface and Coatings Technology; Vol. 203, № 17-18
অনুযায়ী: Ryabchikov A. I. Aleksandr Ilyich
প্রকাশিত: (2009)