Pulse plasma-chemical synthesis of nanosized silicon dioxide from metal-organic precursor tetraethoxysilane; Известия вузов. Физика; Т. 55, № 10-3

Pulse plasma-chemical synthesis of nanosized silicon dioxide from metal-organic precursor tetraethoxysilane; Известия вузов. Физика; Т. 55, № 10-3

Dades bibliogràfiques
Parent link:	Известия вузов. Физика: научный журнал/ Национальный исследовательский Томский государственный университет (ТГУ).— , 1957- Т. 55, № 10-3.— 2012.— [С. 361-363]
Autor corporatiu:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра техники и электрофизики высоких напряжений (ТЭВН)
Altres autors:	Sazonov R. V. Roman Vladimirovich, Ponomarev D. V. Denis Vladimirovich, Kholodnaya G. E. Galina Evgenievna, Remnev G. E. Gennady Efimovich
Sumari:	Заглавие с экрана The work is devoted to the investigations of the plasma-chemical synthesis of nanosized silicon dioxide from metal-organic precursor (tetraethoxysilane) and to the analysis of the properties of the obtained powder. The synthesis of the nanosized oxide was performed on the basis of the laboratory setup comprising a TEA-500 pulse electron accelerator and a reaction chamber. The morphology of the obtained oxide has been studied. The chemical and element composition of the solid-phase product of the plasma-chemical synthesis has been determined. The particles of the synthesized nanosized silicon dioxide have a spherical shape, the average size being 40-80 nm. The C - ? bond is typical for all synthesized SiO 2 samples. Режим доступа: по договору с организацией-держателем ресурса
Idioma:	anglès
Publicat:	2012
Matèries:	электронный ресурс труды учёных ТПУ plasma-chemical synthesis metal-organic precursor electron beam silicon dioxide
Accés en línia:	http://elibrary.ru/item.asp?id=21131106
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=637514

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