Effect of titanium ion implantation and the gas atmosphere on the electrophysical properties of alumina; Technical Physics; Vol. 52, iss. 6

Effect of titanium ion implantation and the gas atmosphere on the electrophysical properties of alumina; Technical Physics; Vol. 52, iss. 6

Dades bibliogràfiques
Parent link:	Technical Physics: Scientific Journal Vol. 52, iss. 6.— 2007.— [P. 734-738]
Autor principal:	Kabyshev A. V. Alexander Vasilievich
Altres autors:	Konusov F. V. Fedor Valerievich
Sumari:	Title screen The energy and kinetic characteristics of the dark conductivity and photoconductivity of polycrystalline alumina irradiated by titanium ions and then annealed in vacuum and air have been studied. The effect of temperature on the properties and electron-transport mechanisms is determined. In the air pressure range from 105 to 1 Pa, the electrophysical properties are reversible. A semiconductor coating can be formed on the alumina surface via vacuum annealing; when heated in air, it becomes insulating. The reverse transition is also possible. These modifications are related to the formation of defects, accumulation of oxygen-containing complexes, and changes in the stoichiometric compositions of the compounds synthesized by the ion thermal treatment. Режим доступа: по договору с организацией-держателем ресурса
Idioma:	anglès
Publicat:	2007
Matèries:	электронный ресурс труды учёных ТПУ глиноземы электрофизические свойства
Accés en línia:	http://link.springer.com/article/10.1134%2FS1063784207060096
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=637353

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