High Pulse Repetition Rate Metal and Metal Halide Vapor Lasers; XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, November 10, 2003, Wroclaw, Poland

Opis bibliograficzny
Parent link:XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, November 10, 2003, Wroclaw, Poland.— 2003.— [P. 60-65]
Kolejni autorzy: Evtushenko G. S. Gennady Sergeevich, Shiyanov D. V. Dmitry Valeryevich, Shestakov D. Yu., Sukhanov V. B. Viktor Borisovich, Fedorov V. F., Zhdaneev O. V. Oleg Valeryevich
Streszczenie:Title screen
In the paper, we show the present state of the art of high pulse repetition frequency (PRF) metal vapor lasers (MVL"s) and metal halide vapor lasers (MHVL"s) development. We also analyze underlying physical features, which limit optimum and maximum PRF of the above lasers and mention the results of the experimental study of high PRF CuBr and PbBr2 vapor lasers. By use of a powerful tasitron as a switch and a small hydrogen additive to the buffer gas Ne we obtained the output power of a practical use with PRF more than 200 kHz. Given PRF 250 kHz and a laser tube of diameter 2.5 cm and length 76 cm, we have got the output power 1.5 W. For PRF 200 kHz and 100 kHz, the output power 3 W and 10.5 W has been got respectively without gas flow across the discharge tube. Experimental and numerical modeling data evidence that the small H2 (or Cs) additives improve the frequency and output features of MVL"s and MHVL"s
Режим доступа: по договору с организацией-держателем ресурса
Język:angielski
Wydane: 2003
Hasła przedmiotowe:
Dostęp online:http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=766173
Format: Elektroniczne Rozdział
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=636856

MARC

LEADER 00000naa0a2200000 4500
001 636856
005 20250920102524.0
035 |a (RuTPU)RU\TPU\network\915 
090 |a 636856 
100 |a 20140404d2003 k||y0rusy50 ba 
101 0 |a eng 
102 |a US 
135 |a drnn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a High Pulse Repetition Rate Metal and Metal Halide Vapor Lasers  |f G. S. Evtushenko [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: p. 64-65 (28 tit.)] 
330 |a In the paper, we show the present state of the art of high pulse repetition frequency (PRF) metal vapor lasers (MVL"s) and metal halide vapor lasers (MHVL"s) development. We also analyze underlying physical features, which limit optimum and maximum PRF of the above lasers and mention the results of the experimental study of high PRF CuBr and PbBr2 vapor lasers. By use of a powerful tasitron as a switch and a small hydrogen additive to the buffer gas Ne we obtained the output power of a practical use with PRF more than 200 kHz. Given PRF 250 kHz and a laser tube of diameter 2.5 cm and length 76 cm, we have got the output power 1.5 W. For PRF 200 kHz and 100 kHz, the output power 3 W and 10.5 W has been got respectively without gas flow across the discharge tube. Experimental and numerical modeling data evidence that the small H2 (or Cs) additives improve the frequency and output features of MVL"s and MHVL"s 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
463 1 |t XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, November 10, 2003, Wroclaw, Poland  |o Proc. SPIE 5120  |v [P. 60-65]  |d 2003 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
701 1 |a Evtushenko  |b G. S.  |c Doctor of Technical Sciences, Professor of Tomsk Polytechnic University (TPU)  |c Russian specialist in electrophysics  |f 1947-  |g Gennady Sergeevich  |3 (RuTPU)RU\TPU\pers\29009  |9 13729 
701 1 |a Shiyanov  |b D. V.  |c specialist in the field of electronics  |c Engineer of Tomsk Polytechnic University  |f 1973-  |g Dmitry Valeryevich  |3 (RuTPU)RU\TPU\pers\31659 
701 1 |a Shestakov  |b D. Yu. 
701 1 |a Sukhanov  |b V. B.  |c specialist in the field of electronics  |c Engineer of Tomsk Polytechnic University  |f 1945-  |g Viktor Borisovich  |3 (RuTPU)RU\TPU\pers\31658 
701 1 |a Fedorov  |b V. F. 
701 1 |a Zhdaneev  |b O. V.  |c specialist in the field of electronics  |c Assistant of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1978-  |g Oleg Valeryevich  |3 (RuTPU)RU\TPU\pers\32101 
801 2 |a RU  |b 63413507  |c 20180316  |g RCR 
856 4 |u http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=766173 
942 |c CF