APA (7th ed.) Citation

Piestrup M. A. Melvin A., Powell M. W. Michael W., Cremer J. T. J. Theodore, Lombardo L. W. Louis W., Kaplin V. V. Valeriy Viktorovich, Uglov S. R. Sergey Romanovich, . . . Mikhalchuk A. A. Aleksandr Alexandrovich. (1998). Compact recycled beam source for XRL and EUVL exposure tools; Emerging Lithographic Technologies II, February 22, 1998, Santa Clara, CA. 1998.

Chicago Style (17th ed.) Citation

Piestrup M. A. Melvin A., et al. Compact Recycled Beam Source for XRL and EUVL Exposure Tools; Emerging Lithographic Technologies II, February 22, 1998, Santa Clara, CA. 1998, 1998.

MLA (9th ed.) Citation

Piestrup M. A. Melvin A., et al. Compact Recycled Beam Source for XRL and EUVL Exposure Tools; Emerging Lithographic Technologies II, February 22, 1998, Santa Clara, CA. 1998, 1998.