Осаждение плёнок оксида меди при магнетронном распылении в металлическом режиме
| Parent link: | Перспективы развития фундаментальных наук=Prospects of Fundamental Sciences Development: сборник научных трудов XIX Международной конференции студентов, аспирантов и молодых ученых, г. Томск, 26-29 апреля 2022 г./ Национальный исследовательский Томский политехнический университет (ТПУ) ; под ред. И. А. Курзиной, Г. А. Вороновой.— , 2022 Т. 1 : Физика.— 2022.— [С. 50-52] |
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| Izvleček: | Заглавие с экрана This article describes the possibility of film deposition of copper oxide using magnetron sputtering in Ar+O2 operating in a metallic mode. To do this, hysteresis of discharge voltage was obtained at constant (20 sccm) Ar and variable (100 sccm) O2 gas flows, with and without using additional radio-frequency plasma source RPG-128. Then, CuOx films were obtained in metallic modes of magnetron sputtering of copper target at a discharge power of 1000 and 2000 W. These films were investigated by X-ray diffraction to determine its crystal structure. |
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2022
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| Online dostop: | http://earchive.tpu.ru/handle/11683/72900 |
| Format: | Elektronski Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=634674 |
| Izvleček: | Заглавие с экрана This article describes the possibility of film deposition of copper oxide using magnetron sputtering in Ar+O2 operating in a metallic mode. To do this, hysteresis of discharge voltage was obtained at constant (20 sccm) Ar and variable (100 sccm) O2 gas flows, with and without using additional radio-frequency plasma source RPG-128. Then, CuOx films were obtained in metallic modes of magnetron sputtering of copper target at a discharge power of 1000 and 2000 W. These films were investigated by X-ray diffraction to determine its crystal structure. |
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