Formation of bulk WC[1-X]-based coatings on metal substrates at highspeed sputtering of electric discharge plasma jet; Gas Discharge Plasmas and Their Applications (GDP 2019)

Formation of bulk WC[1-X]-based coatings on metal substrates at highspeed sputtering of electric discharge plasma jet; Gas Discharge Plasmas and Their Applications (GDP 2019)

Bibliographic Details
Parent link:	Gas Discharge Plasmas and Their Applications (GDP 2019).— 2019.— [С. 225]
Corporate Authors:	Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа энергетики Отделение электроэнергетики и электротехники (ОЭЭ)
Other Authors:	Sivkov A. A. Aleksandr Anatolyevich, Ivashutenko A. S. Alexander Sergeevich, Shanenkov I. I. Ivan Igorevich, Shanenkova Yu. L. Yuliya Leonidovna, Rakhmatullin I. A. Ilyas Aminovich
Summary:	Заглавие с титульного экрана
Language:	English
Published:	2019
Subjects:	электронный ресурс труды учёных ТПУ покрытия подложки распыление плазменные струи каталитические свойства металлы катализаторы карбид вольфрама
Online Access:	http://earchive.tpu.ru/handle/11683/57750
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=630882

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