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Reducing the value of transient contact resistance due to deposition of copper coatings on aluminum samples by plasmodynamic method; German-Russian Forum Nanotechnology

Reducing the value of transient contact resistance due to deposition of copper coatings on aluminum samples by plasmodynamic method; German-Russian Forum Nanotechnology

Detaylı Bibliyografya
Parent link:German-Russian Forum Nanotechnology.— 2013.— [P. 47]
Yazar: Sivkov A. A. Aleksandr Anatolyevich
Müşterek Yazar: Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электроснабжения промышленных предприятий (ЭПП)
Diğer Yazarlar: Saigash A. S. Anastasiya Sergeevna, Kolganova J. L. Julia Leonidovna
Özet:Title screen.
Dil:İngilizce
Baskı/Yayın Bilgisi: 2013
Konular:
труды учёных ТПУ
электронный ресурс
Online Erişim:http://www.lib.tpu.ru/fulltext/c/2013/C100/003.pdf
Materyal Türü: Elektronik Kitap Bölümü
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=613653
  • Erişim Bilgileri
  • Diğer Bilgiler
  • Benzer Materyaller
  • MARC Görünümü

Internet

http://www.lib.tpu.ru/fulltext/c/2013/C100/003.pdf

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