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Reducing the value of transient contact resistance due to deposition of copper coatings on aluminum samples by plasmodynamic method; German-Russian Forum Nanotechnology

Reducing the value of transient contact resistance due to deposition of copper coatings on aluminum samples by plasmodynamic method; German-Russian Forum Nanotechnology

Dettagli Bibliografici
Parent link:German-Russian Forum Nanotechnology.— 2013.— [P. 47]
Autore principale: Sivkov A. A. Aleksandr Anatolyevich
Ente Autore: Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электроснабжения промышленных предприятий (ЭПП)
Altri autori: Saigash A. S. Anastasiya Sergeevna, Kolganova J. L. Julia Leonidovna
Riassunto:Title screen.
Lingua:inglese
Pubblicazione: 2013
Soggetti:
труды учёных ТПУ
электронный ресурс
Accesso online:http://www.lib.tpu.ru/fulltext/c/2013/C100/003.pdf
Natura: Elettronico Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=613653
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Accesso online

http://www.lib.tpu.ru/fulltext/c/2013/C100/003.pdf

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