Исследование проникновения водорода в тонкопленочную систему Аl[2]O[3]/Ti из сред разного агрегатного состояния; Перспективы развития фундаментальных наук
| Parent link: | Перспективы развития фундаментальных наук.— 2015.— [С. 118-121] |
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| Hlavní autor: | |
| Korporativní autor: | |
| Další autoři: | , |
| Shrnutí: | Заглавие с экрана One of the ways to protect titanium and its alloys from embrittlement is the application of thin films on the surface of our samples. Such films were obtained by magnetron sputtering of samples of nanocrystalline titanium, samples saturated with hydrogen. Also, the article presents an experimental study on the saturation of the samples with hydrogen by electrolytic, plasma and Siverts's methods. A Al2O3 film is a good barrier to the penetration of hydrogen into the metals, especially in conditions of its operation under reduced pressure (for example, during plasma saturation). |
| Jazyk: | ruština |
| Vydáno: |
2015
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| Edice: | Физика |
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| On-line přístup: | http://earchive.tpu.ru/handle/11683/19126 http://www.lib.tpu.ru/fulltext/c/2015/C21/030.pdf |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=612937 |
| Fyzický popis: | 1 файл(821 Кб) |
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| Shrnutí: | Заглавие с экрана One of the ways to protect titanium and its alloys from embrittlement is the application of thin films on the surface of our samples. Such films were obtained by magnetron sputtering of samples of nanocrystalline titanium, samples saturated with hydrogen. Also, the article presents an experimental study on the saturation of the samples with hydrogen by electrolytic, plasma and Siverts's methods. A Al2O3 film is a good barrier to the penetration of hydrogen into the metals, especially in conditions of its operation under reduced pressure (for example, during plasma saturation). |