A vacuum arc cathode magnetic field and a substrate bias influence on a macroparticle content decreasing

A vacuum arc cathode magnetic field and a substrate bias influence on a macroparticle content decreasing

Bibliografische gegevens
Parent link:	Физико-технические проблемы в науке, промышленности и медицине: сборник тезисов докладов VII Международной научно-практической конференции, г. Томск, 3-6 июня 2015 г./ Национальный исследовательский Томский политехнический университет (ТПУ) ; под ред. А. Н. Дьяченко [и др.]. [С. 215-216].— , 2015
Coauteurs:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22, Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ)
Andere auteurs:	Ryabchikov A. I. Aleksandr Ilyich, Ananin P. S. Petr Semenovich, Sivin D. O. Denis Olegovich, Shevelev A. E. Aleksey Eduardovich, Zhelomsky S. G.
Samenvatting:	Заглавие с титульного экрана
Taal:	Engels
Gepubliceerd in:	2015
Reeks:	Радиационные и пучково-плазменные технологии в науке, технике и медицине
Onderwerpen:	труды учёных ТПУ электронный ресурс магнитные поля подложки макрочастицы плазма
Online toegang:	http://earchive.tpu.ru/handle/11683/17445 http://www.lib.tpu.ru/fulltext/c/2015/C49/184.pdf
Formaat:	Elektronisch Hoofdstuk
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=612764

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