Изучение столкновительного распыления металлов в широком диапазоне начальных энергий падающих ионов; Перспективы развития фундаментальных наук
| Parent link: | Перспективы развития фундаментальных наук.— 2013.— [С. 174-176] |
|---|---|
| Autor principal: | |
| Autor corporatiu: | |
| Altres autors: | |
| Sumari: | Заглавие с экрана The present work is devoted to investigation of collisional sputtering of metals under accelerated ions of initial energies from 10-2 to 103 keV. Sputtering yields are calculated by means of Sigmund theory expressions. Dependences of sputtering yield on ion initial energy, atomic number, and sublimation energy of a target material and ion incidence angle are studied. Maximum sputtering yield conditions are defined in the case of Ar+ and Xe+ ions. Sputtering yield is apt to grow for materials with sublimation energy of 1.5-2.4 eV. Materials with high melting temperature have lower sputtering yield. The sputtering yield maximum is observed at an ion incidence angle of 65-75°. |
| Idioma: | rus |
| Publicat: |
2013
|
| Col·lecció: | Физика |
| Matèries: | |
| Accés en línia: | http://www.lib.tpu.ru/fulltext/c/2013/C21/055.pdf |
| Format: | Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=603625 |