Vacuum arc deposition of TIN and TIOx films on large metallic and dielectric surfaces

Vacuum arc deposition of TIN and TIOx films on large metallic and dielectric surfaces

Bibliografiske detaljer
Parent link:	Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996.— , 1996 Vol. 2.— 1996.— P. 881-883
Andre forfattere:	Borisov D. P., Koval N. N. Nikolay Nikolaevich, Kovsharov N. F., Tolkachev V. S., Schanin P. M.
Summary:	Plasma-assisted vacuum deposition of TiN and TiOx films is performed using four vacuum arc evaporators and four hot-cathode-arc plasma generators. Film deposition on substrates of total area 6 m2 , with the workpiece having dimensions of 1?1.6 m, is completed in one cycle. The arc parameters in the process of film deposition are typically as follows: the vacuum arc current and voltage are 100 A and 30 V, respectively, and the hot-cathode arc current and voltage are 20 A and 50 V, respectively. The deposition of a TiN film on a metal takes 50 min, while the TiN or TiOx film deposition on a dielectric occurs within 20 min. В фонде НТБ ТПУ отсутствует
Sprog:	engelsk
Udgivet:	1996
Fag:	труды учёных ТПУ
Format:	Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602548

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