Vacuum arc deposition of TIN and TIOx films on large metallic and dielectric surfaces; Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996; Vol. 2
| Parent link: | Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996.— , 1996 Vol. 2.— 1996.— P. 881-883 |
|---|---|
| অন্যান্য লেখক: | , , , , |
| সংক্ষিপ্ত: | Plasma-assisted vacuum deposition of TiN and TiOx films is performed using four vacuum arc evaporators and four hot-cathode-arc plasma generators. Film deposition on substrates of total area 6 m2 , with the workpiece having dimensions of 1?1.6 m, is completed in one cycle. The arc parameters in the process of film deposition are typically as follows: the vacuum arc current and voltage are 100 A and 30 V, respectively, and the hot-cathode arc current and voltage are 20 A and 50 V, respectively. The deposition of a TiN film on a metal takes 50 min, while the TiN or TiOx film deposition on a dielectric occurs within 20 min. В фонде НТБ ТПУ отсутствует |
| ভাষা: | ইংরেজি |
| প্রকাশিত: |
1996
|
| বিষয়গুলি: | |
| বিন্যাস: | গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602548 |
অনুরূপ উপাদানগুলি
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অনুযায়ী: Mesyats G. A. Gennady Andreyevich
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অনুযায়ী: Mesyats G. A. Gennady Andreyevich
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Vacuum Tubes
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অনুযায়ী: Spangenberg К. R. Karl
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