Vacuum arc deposition of TIN and TIOx films on large metallic and dielectric surfaces; Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996; Vol. 2
| Источник: | Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996.— , 1996 Vol. 2.— 1996.— P. 881-883 |
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| Другие авторы: | , , , , |
| Примечания: | Plasma-assisted vacuum deposition of TiN and TiOx films is performed using four vacuum arc evaporators and four hot-cathode-arc plasma generators. Film deposition on substrates of total area 6 m2 , with the workpiece having dimensions of 1?1.6 m, is completed in one cycle. The arc parameters in the process of film deposition are typically as follows: the vacuum arc current and voltage are 100 A and 30 V, respectively, and the hot-cathode arc current and voltage are 20 A and 50 V, respectively. The deposition of a TiN film on a metal takes 50 min, while the TiN or TiOx film deposition on a dielectric occurs within 20 min. В фонде НТБ ТПУ отсутствует |
| Язык: | английский |
| Опубликовано: |
1996
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| Предметы: | |
| Формат: | MixedMaterials Статья |
| Запись в KOHA: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602548 |
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| 200 | 1 | |a Vacuum arc deposition of TIN and TIOx films on large metallic and dielectric surfaces |f D. P. Borisov [et al.] | |
| 330 | |a Plasma-assisted vacuum deposition of TiN and TiOx films is performed using four vacuum arc evaporators and four hot-cathode-arc plasma generators. Film deposition on substrates of total area 6 m2 , with the workpiece having dimensions of 1?1.6 m, is completed in one cycle. The arc parameters in the process of film deposition are typically as follows: the vacuum arc current and voltage are 100 A and 30 V, respectively, and the hot-cathode arc current and voltage are 20 A and 50 V, respectively. The deposition of a TiN film on a metal takes 50 min, while the TiN or TiOx film deposition on a dielectric occurs within 20 min. | ||
| 333 | |a В фонде НТБ ТПУ отсутствует | ||
| 461 | |t Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996 |d 1996 | ||
| 463 | |t Vol. 2 |v P. 881-883 |d 1996 | ||
| 610 | 1 | |a труды учёных ТПУ | |
| 701 | 1 | |a Borisov |b D. P. | |
| 701 | 1 | |a Koval |b N. N. |c specialist in the field of electronics |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Nikolay Nikolaevich |3 (RuTPU)RU\TPU\pers\34748 | |
| 701 | 1 | |a Kovsharov |b N. F. | |
| 701 | 1 | |a Tolkachev |b V. S. | |
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