Nanosecond high current and high repetition rate electron source; Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996; Vol. 27, № 4

Nanosecond high current and high repetition rate electron source

Chi tiết về thư mục
Parent link:	Proceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996.— , 1996 Vol. 27, № 4.— 1996.— P. 1055-1059
Tác giả khác:	Gushenets V. I., Koval N. N. Nikolay Nikolaevich, Schanin P. M., Tolkachev V. S.
Tóm tắt:	A broad electron beam source with a plasma hollow cathode has been developed which is intended for production of nanosecond electron beams with a high repetition rate. The source lifetime is over 109 shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 kV a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced. В фонде НТБ ТПУ отсутствует
Ngôn ngữ:	Tiếng Anh
Được phát hành:	1996
Những chủ đề:	труды учёных ТПУ
Định dạng:	Chương của sách
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=602544

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